設備名稱 Equipment Name

鏈式酸拋光清洗設備  Inline Acid Polishing Equipment

設備型號 Equipment Model

SC-LSP4500/ SC-LSP8000

設備用途 Equipment Application

對單、多晶硅片進行刻蝕/拋光、清洗、干燥。
Etching/polishing, cleaning and drying of mono/multi crystalline solar cells.

工藝流程 Process Flow

正面保護→刻蝕/拋光→堿洗→酸洗→烘干
Water layer protection→Etching/Polishing→Alkaline cleaning→Acid Cleaning→Drying

技術特點  Features

1. 高產能：5道，4500片/小時，10道，8000片/小時。

High Throughput:5-lane 4500pcs/h; 10-lane 8000pcs/h.

2. 高均勻性，超長藥液壽命。
Excellent Uniformity, long bath life time.

3. 支持多種添加劑或混合添加劑技術。
Various additives or mixed additives technology.

4. 支持最薄120μm硅片。
Wafer thickness handling capability up to 120μm.

5. 快速換液，在線換液。
Quick inline bath change.

6. ?持背面拋光工藝，超低藥耗。
Suitable for rear side polishing and with low chemical consumption.

7. ?持MES，選配在線稱重檢測。
Suitable with MES ; Inline weight testing is optional.

8. 兼容酸拋光功能。
Compatible with acid polish function.

設備參數  Parameters